>>> 'technics-b' problem from hebert -- Fri Feb 23 15:53:21 1990 <<<

The temperature does not seem to recover as fast as it usually
does after loading a wafer. Maybe the TC is not making good
contact with the substrate table.

There was some instability in the SiH4 MFC. I tapped the side
panel of the PD Module, and the MFC stabilized. It fluctuated
between 4 and 12 sccm SiH4 at the beginning of my test dep
and went down to -25 when turned off.

Dispite these anomalities, my dep went well using 63.0 sccm N20,
8.0 sccm SiH4, and 10 W RF. The dep rate was 130 A/min, Nf = 1.48.

>>> 'technics-b' problem from phillip -- Tue Mar  6 08:29:16 1990 <<<

P: Base pressure hovering @ ~60 microns (too high).
S: Replaced all feed-thru o-rings. Calibrated capacitance
   manometer. Removed oxidation from tc sheath.

the -b machine should perform better now.

>>> 'technics-b' problem from fujieda -- Thu Mar  8 12:52:45 1990 <<<

Explosion after the end of the run when N2O is introduced to purge SiH4. I reported the problem to staff and he will take care of it. The dep. conditions of my run is SiH4 20sccm, temp.300C,20W rf power, dep. time 1 hr, roteted the substrate halfway.

>>> 'technics-b' problem from phillip -- Thu Mar  8 13:22:24 1990 <<<

Restarted slight n2 pump purge.
CF4 clean in progress.

>>> 'technics-b' problem from phillip -- Thu Mar  8 14:41:50 1990 <<<

P: Violent reaction in chamber left it filthy.
S: CH4 clean for 2 hours rendered the chamber clean'
   and suitable for use.
-b is up and available for use.

>>> 'technics-b' problem from bob -- Fri Mar  9 14:55:11 1990 <<<

The n2 case purge for the exhaust of technics-b has been checked.
It has some oil in the N2 rotameter. The rotameters will be replaced
with superior units and additional check valves will be installed.
This will be added to parrish's techjobs.

>>> 'technics-b' problem from bob -- Fri Mar  9 14:57:39 1990 <<<

Then case purge on technics-b has been checked. The flow rate is adequate
for all processes used on technics-b.
technics-b is up.

>>> 'technics-b' problem from parrish -- Wed Mar 14 13:13:46 1990 <<<

problem:    rotometers not function properly

cause:      inferior quality

solution:   removed and replaced with a better quality one.

>>> 'technics-b' problem from field -- Thu Apr  5 16:56:19 1990 <<<

Base pressure pretty high - gets down to 75 mTorr after a LONG wait.
Also, when vent switch first thrown, makes a sound like a BART-door
closing.

>>> 'technics-b' fix from phillip -- Fri Apr  6 08:42:52 1990 <<<

P: High base pressure.
S: Replaced defected heater. The problem as reported
   by Leslie is fixed.
(A freon clean of the chamber before processing is advisable)
From hebert Fri Apr  6 10:04:22 1990
Return-Path: <hebert>
Received: by argon.berkeley.edu. (4.1/SMI-4.0)
	id AA07156; Fri, 6 Apr 90 10:04:12 PDT
Date: Fri, 6 Apr 90 10:04:12 PDT
From: hebert (David Hebert)
Message-Id: <9004061704.AA07156@argon.berkeley.edu.>
To: technics-b
Subject: technics-b comments
Status: R

When cleaning the chamber before starting your run, you should
use only Technicloths and methanol. Do not use acetone or DI water.
Acetone will damage the lid o-ring seal, and DI water causes the
background pressure of water to be high.


>>> 'technics-b' problem from hebert -- Thu Apr 12 07:40:15 1990 <<<

Over a 4 hour period, the chamber base pressure increased from
50 mTorr to 100 mTorr. 

I used 350 deg C electrode, 63.0 sccm N2O, 7.0 sccm SiH4, and
10 W to get a dep rate of 115 A/min and Nf=1.50. The uniformity
across a 100 mm wafer at the "4 o'clock" electrode position was 
within 7% across the wafer without rotating the substrate.

I checked the dep rate and film Nf at the beginning and end of the
time period that I used technics-b, and observed no change in either.
However, the chamber should be leak checked to determine whether
or not there is a leak.

Also, before starting my run, I noticed a yellow powder in the chamber.
This could be from the deposition of silicon nitride, which is NOT
permitted in this chamber. I removed the yellow powder at the predep
chamber clean step.

>>> 'technics-b' fix from phillip -- Thu Apr 12 08:27:21 1990 <<<

P: High base pressure.
S: Cleaned out capacitance manometer
   port. Calibrated baritron with standard.
   Base pressure ~20 microns. The Problem
   as reported by Dave is repaired.
The -b machine is  up and available for use.

>>> 'technics-b' problem from field -- Thu Apr 19 13:50:33 1990 <<<

Qualifying Diane Hoffstetter on technics-b.

BIG whiff of gas as we initially vented the machine - may be 
NH3.  Made Diane gag and her eyes water.  I could smell it
too (she was closer to the machine).

Please check machine for gas leaks!

>>> 'technics-b' problem from phillip -- Fri Apr 20 14:43:33 1990 <<<

There is a problem that minute amounts of NH3 are olifactorily
detectable. This poses no real safety or processing hazard.
This problem will be looked into on Monday a.m. Until then,

the machine is up and available for use.........
.,
,.

>>> 'technics-b' fix from phillip -- Mon Apr 23 13:01:53 1990 <<<

P: NH3 smell apparent when opening chamber.
S: Rebuilt 2 servo--solenoids. Replaced nupro
   pneumatically operated solenoid. 
The problem as reported by Leslie and Diane is fixed.
The -b machine is available for use.
