>>> 'lam1' problem from voros -- Wed Jan 10 15:47:56 1990 <<<

alarm problem on lam1 from voros (10-jan-1990 15:42)

User Comments:
Ignore, this is a test.

>>> 'lam1' problem from voros -- Wed Jan 10 16:01:37 1990 <<<

alarm problem on lam1 from voros (10-jan-1990 15:42)

User Comments:
Ignore, this is a test.


Comments from voros at 10-jan-1990 16:01 :
ignire test

>>> 'lam1' problem from voros -- Wed Jan 10 16:05:44 1990 <<<

test, ignore

>>> 'lam1' problem from mudie -- Thu Jan 11 15:09:36 1990 <<<

alarm problem on lam1 from mudie (11-jan-1990 14:59)

User Comments:
test problem, ignore

>>> 'lam1' problem from mudie -- Thu Jan 11 15:17:07 1990 <<<

alarm problem on lam1 from mudie (11-jan-1990 14:59)

User Comments:
test problem, ignore


Comments from mudie at 11-jan-1990 15:16 :
new valve on order

>>> 'lam1' problem from mudie -- Thu Jan 11 15:19:00 1990 <<<

alarm problem on lam1 from mudie (11-jan-1990 14:59)

User Comments:
test problem, ignore


Comments from mudie at 11-jan-1990 15:16 :
new valve on order


Comments from mudie at 11-jan-1990 15:18 :
valve arrived and installed, back on line

>>> 'lam1' problem from voros -- Thu Jan 11 16:31:01 1990 <<<

leak problem on lam1 from voros (11-jan-1990 16:27)

User Comments:
test, ignore

>>> 'lam1' problem from voros -- Thu Jan 11 16:50:36 1990 <<<

leak problem on lam1 from voros (11-jan-1990 16:27)

User Comments:
test, ignore

Comments from voros at 11-jan-1990 16:49 :
gas leak fixed; this is a test, ignore

>>> 'lam1' problem from mudie -- Fri Jan 12 13:55:45 1990 <<<

lamother problem on lam1 from mudie (12-jan-1990 13:54)

User Comments:
dummy problem, please ignore

>>> 'lam1' problem from mudie -- Fri Jan 12 14:27:34 1990 <<<

o-rings problem on lam1 from mudie (12-jan-1990 14:26)

User Comments:
dirty o-ring on lam1
please ignore, still testing

>>> 'lam1' problem from mudie -- Fri Jan 12 14:37:16 1990 <<<

o-rings problem on lam1 from mudie (12-jan-1990 14:26)

User Comments:
dirty o-ring on lam1
please ignore, still testing

Comments from mudie at 12-jan-1990 14:36 :

o-ring arrived, installed.  machine back up

>>> 'lam1' problem from mudie -- Sat Jan 13 18:02:39 1990 <<<

electrodes problem on lam1 from mudie (13-jan-1990 18:01)

User Comments:
test, ignore

>>> 'lam1' problem from mudie -- Sat Jan 13 18:04:38 1990 <<<

electrodes problem on lam1 from mudie (13-jan-1990 18:01)

User Comments:
test, ignore

Comments from mudie at 13-jan-1990 18:04 :
clearing test problem

>>> 'lam1' problem from field -- Mon Jan 15 15:14:52 1990 <<<

pen is running out of ink.

>>> 'lam1' problem from rnorman -- Tue Jan 16 13:28:12 1990 <<<

Problem: Chart recorder pen running out of inc.

Solution: After trying a couple pens I found one that was not dry
          and installed it on the chart recorder.  More pens will be
          ordered by kellogg, since we have no more in stock.  The
          newly installed pen was tested and works well. 

>>> 'lam1' problem from mudie -- Wed Jan 17 16:54:55 1990 <<<

clean problem on lam1 from mudie (17-jan-1990 16:42)

User Comments:
test problem, please ignore

>>> 'lam1' problem from mudie -- Wed Jan 17 16:56:47 1990 <<<

clean problem on lam1 from mudie (17-jan-1990 16:42)

User Comments:
test problem, please ignore


Comments from mudie at 17-jan-1990 16:56 :
test update

>>> 'lam1' problem from mudie -- Wed Jan 17 18:10:36 1990 <<<

clean problem on lam1 from mudie (17-jan-1990 16:42)

User Comments:
test problem, please ignore


Comments from mudie at 17-jan-1990 16:56 :
test update

Comments from mudie at 17-jan-1990 18:10 :
clearing test problem

>>> 'lam1' problem from judy -- Mon Jan 22 01:10:41 1990 <<<

The exit arm got stuck holding one of my wafers with the exit door open.  
I tried to cycle to machine on/off then run the wafer clean 
out proceedure.  That didn't work so I tried
to pull my wafer out of the exit chamber with my tweezers - BIG mistake.
The exit port immediately thought that the wafer was gone and started to 
close the exit door ---- thereby smashing my wafer all over the inside
and outside of the exit chamber.  After I did this the exit chamber failed
to pump down so I performed the wafer clean out proceedure and on/off
cycle until I could clean off the seal of the exit door.  I was then able
to run the rest of my wafers with little problem.  What is left is to 
clean out the inside of the exit chamber.

>>> 'lam1' problem from rnorman -- Mon Jan 22 08:28:01 1990 <<<

Problem: Exit arm stuck.

Solution: Adjusted arm speed by adjusting the air solenoid to the 
          "out" cylinder.  The arm was tested and the lam1 is up.

>>> 'lam1' problem from judy -- Mon Jan 22 11:49:01 1990 <<<

Black polymer build up during long etch sequence (2-2.5 um of poly).
Etch rate decreased to 2000 A/min to 1000 A/min!!
Chamber needs to be cleaned - I think.

>>> 'lam1' problem from rnorman -- Tue Jan 23 10:44:59 1990 <<<

The lam1 chamber will be cleaned starting at this time.  It should be
up after lunch.

>>> 'lam1' problem from rnorman -- Tue Jan 23 12:01:21 1990 <<<

Problem: Polymer showing on wafer.

Cause: Chamber very dirty!

Solution: The chamber was throughly cleaned, I had to even scrape
          some of the polymer up with a razor blade.  Afterward a
          plasma clean was ran for 15 min.  The lam1 is up.

>>> 'lam1' problem from judy -- Wed Jan 24 01:05:23 1990 <<<

Helium flow rate too low - maybe the supply is low.

>>> 'lam1' problem from rnorman -- Wed Jan 24 09:56:26 1990 <<<

Problem: Low  He flow error.

Cause: Dirty connector on MFC.

Solution: The He pressure to the MFC was turned up to 25psi and
          down to 15 psi to see if pressure was effecting the 
          MFC H2 flow, but it was not; it still was giving low
          flow error.  The connectors between the He and O2 were
          switched to test if the MFC or the electronics were bad,
          but nothing occurred.  I then cleaned the MFC connector
          and adjusted the pin's for a tighter fit.  I ran a 10
          minute process with no error or fluctuation on the He
          MFC read out. The lam1 is up.

>>> 'lam1' problem from mudie -- Thu Jan 25 09:30:13 1990 <<<

temperature problem on lam1 from mudie (25-jan-1990 09:26)

User Comments:
temperature too high for my run

>>> 'lam1' problem from mudie -- Thu Jan 25 09:38:18 1990 <<<

temperature problem on lam1 from mudie (25-jan-1990 09:26)

User Comments:
temperature too high for my run


Comments from mudie at 25-jan-1990 09:38 :
pump motor fixed

>>> 'lam1' problem from judy -- Thu Jan 25 10:38:29 1990 <<<

The exit arm was stuck again.

>>> 'lam1' problem from rnorman -- Thu Jan 25 11:36:17 1990 <<<

Problem: exit arm sticking, will not move out.

Cause: Sticky air cylinder.

Solution: The "out" cylinder exhaust port was adjusted open a
          little more. When I get some time I will put some
          oil into the cylinder. The lam1 is up.

          

>>> 'lam1' problem from mudie -- Tue Jan 30 16:14:24 1990 <<<

gap problem on lam1 from mudie (30-jan-1990 16:11)

User Comments:
another test problem, please ignore

>>> 'lam1' problem from mudie -- Wed Jan 31 14:24:18 1990 <<<

lamsymptom problem on lam1 from mudie (31-jan-1990 14:23)

User Comments:
test lam problem

>>> 'lam1' problem from mudie -- Wed Jan 31 15:23:25 1990 <<<

temperature problem on lam1 from mudie (31-jan-1990 15:22)

User Comments:
run exited too early
test message only, please ignore

>>> 'lam1' problem from mudie -- Wed Jan 31 15:26:59 1990 <<<

temperature problem on lam1 from mudie (31-jan-1990 15:22)

User Comments:
run exited too early
test message only, please ignore


Diagnosed as water (DI water system) by mudie (31-jan-1990 15:25:20)

Comments from mudie at 31-jan-1990 15:26 :
clearing test problem

>>> 'lam1' problem from voros -- Thu Feb  1 15:18:38 1990 <<<

Pls check and calibrate the MFC's. Students reported a drift in
processing results in etching poly-Si. Also, inspect chamber for 
cleanliness.

>>> 'lam1' problem from rnorman -- Fri Feb  2 09:01:50 1990 <<<

Those users that are having process problems with the lam1 please
contact me so that I can get some facts on the problem and put
together a plan of attack.  
From judy Mon Feb  5 17:36:10 1990
Return-Path: <judy>
Received: by argon.berkeley.edu. (4.1/SMI-4.0)
	id AA27867; Mon, 5 Feb 90 17:36:07 PST
Date: Mon, 5 Feb 90 17:36:07 PST
From: judy (Michael Judy)
Message-Id: <9002060136.AA27867@argon.berkeley.edu.>
To: bob, rnorman
Subject: lam1 - problems
Cc: voros
Status: R

All,

I talked with Ken L. from Lam Research today (659-2063).  I told him
of our troubles including the black fogging of the wafers and the
top Aluminum electrode wear.  He basically said what we already
expected - that it is time to change the electrode.  I got the
information on the electrodes that we need.  

	top electrode (old style)  #715-01408-001        $766

	bottom electrode (mushroom lifter)  #715-4042-1  $859
		(pull out entire assemble - difficult!)

He said that the electrodes start to fail after about 10,000
wafers.  Have we processd that many?  Other things to check
would be whether the Al electrode was shorted to the chassis and
pitting in both of the electrodes.  He also suggested that both
electrodes be replaced since the bottom one is probably
weakened.  Hope this is helpful.  How long would it talk to
install a new electrode in lam1?

Mike


>>> 'lam1' problem from judy -- Tue Feb  6 08:30:33 1990 <<<

Here is a summary of the problems I have encountered in using lam1.

1.  The etch rate has been very slow - 1000-2000 A/min - which is about
    half of the etch rate documented in the wand for the standard recipe.
    (I used both the standard and Martin Lim's recipe which is
    200 W, 130:10:130  CCl4:O2:He, 1.2 gap, 280 mtorr)

2.  As the etch progresses the poly areas become BLACK!  Very much like
    carbon deposits - charcoal color.  In addition the blackness seems
    to be more pronounced in the open areas (darker), and the intensity
    or darkness of the black also varys over a single die (Looks like
    some kind of flow had deposited the blackness?  Like a river with
    deposits in the eddy currents around some of my structures.)

    Overall the deposits are very uniform for a macro perspective!

    As the etch continues the blackness becomes browner, but does not
    completely disappear.  I have even done some wet Si etching to 
    remove the poly peaks (see below).  This helped but did not remove
    all the browness.

3.  I have examined some of my wafers in the SEM.  There is entensive
    peaking occuring (like micromasking but the top of the peak is
    sharp).  In addition the peaking seems to occur mostly in
    the larger open areas.

The structure I have been trying to etch is:  PSG (5000 A) TOP, 
poly (2.5 um) undoped, PSG (5000 A), Si wafer.  I annealed the entire
structure at 1050 for 1 hr to dope the polysilicon.  I have used a photoresist
mask to pattern the oxide, and dipped the wafers in 5:1 BHF for 10 sec
to remove any leftover oxide.  I have both etched in lam1 with and without
the photoresist mask.  I get the same results for both cases.  Leslie
has also done some testing of her own and she has the same results.

Mike Judy

>>> 'lam1' problem from rnorman -- Tue Feb  6 10:29:15 1990 <<<

The lam1 will be down to replaced the cathode.  This job will
take 2 days.  You will be informed of progress.

>>> 'lam1' problem from rnorman -- Tue Feb  6 14:58:53 1990 <<<

The upper electode was removed and is in the tech room.  The
lam1 is under vacuum, with the blank-off on the chamber.  I
will continue replacement of the cathode tomorrow.
*** The lm1 is down, DO NOT OPERATE ***

>>> 'lam1' problem from rnorman -- Wed Feb  7 09:32:33 1990 <<<

The cathode was removed and replaced with a new Al upper
electrode.  The  old one was very much etch away, a strong
cause of contamination to wafers.  I checked the palallelizom
of the upper to lower electrode and it is off by .003-.005"; I
will adjust this gap to be with in .002".  The lam1 should be
up for use by 12noon, if things go right.
***DO NOT OPERATE***

>>> 'lam1' problem from rnorman -- Wed Feb  7 15:15:16 1990 <<<

Problem: Cathode eroding, possibly contaminating wafers.

Cause: Usage, in need of replacing.  Should be replaced every
       10,000 wafers.

Solution: The upper electrode was replaced and a parallelism was
          done to make the two electrode parallel; it is with in
          .002", but using putty balls is not too accurate.  
          The chamber was cleaned by wiping out with alcohol,
          also a plasma clean was ran. The lam1 is up.

>>> 'lam1' problem from judy -- Thu Feb  8 11:49:48 1990 <<<

1. Ran 3 3min O2 scourges

2. Ran 1 test wafer 6 times 2min - standard recipe (300W, 1.5 cm gap,
   CCl4:O2:He  130:15:130, and 280 mtorr)

3. Results:  BAD!  Same problems as before!  Blackness and very low
             etch rates.

--------------------------

Robert suggested that one of the gases/liquids may be contaminated.  He looked
at the CCl4 level and there WAS NO CCl4 LEFT!!!!  EMPTY!!  The level detector
must either be stuck or defective.  Also, I still get a flow rate on the
status screen so maybe there is a leak into the CCl4 liquid tank (like air).
(question:  Does the CCl4 use a carrier gas or is it directly evaporated?)

Mike

>>> 'lam1' problem from rnorman -- Thu Feb  8 14:54:00 1990 <<<

Problem: Still more blackness on wafers.

Solution: I could not find a leak on the CCL4 gas line, so count that out.
          The tank still had some CCL4 in it thats why we were getting gas 
          flow; it was filled up with CCL4.  I also removed the in-line gas 
          filter, just to see what happens; we do not need it, it is
          just over kill.  Try it again and let me know what happens. The
          lam1 is up.

>>> 'lam1' problem from judy -- Fri Feb  9 18:21:33 1990 <<<

1.  He flow rate only slightly below nom. - 127 sccm instead of 130.

2.  Still having same troubles - blackness although not as bad.
    Peaking is the result.  I can see the peaks in the microscope
    in the vlsi room.

>>> 'lam1' problem from liew -- Sun Feb 11 12:48:57 1990 <<<

Alarm came on when equipment was not in use. Message on the monitor says
coolant overtmp.

>>> 'lam1' problem from bob -- Mon Feb 12 09:27:36 1990 <<<

The coolant flow problem on lam1 has been fixed. The chiller needed
service. For elaboration on this problem, check lam2 problems on
this same date.
.,

>>> 'lam1' problem from judy -- Thu Feb 15 10:02:24 1990 <<<

'WARNING: OVRRUN ERROR' keeps periodically flashing.  
What does this mean?  Can I operate the machine?

>>> 'lam1' problem from rnorman -- Thu Feb 15 11:49:22 1990 <<<

Problem: OVRRUN ERROR periodically flashing.

Cause: The problem is related to the SECS link, LAM LINK.

Solution: If this problem persists we could have a Serial I/O
          board problem.  Or the problem could just be a transmit
          error through SECS.  Continue to report the problem, but
          continue to run, because it does not affect operation.
          The lam1 is up.

>>> 'lam1' problem from judy -- Fri Feb 16 00:24:28 1990 <<<

WARNING: OVRRUN ERROR - it is still happening....

>>> 'lam1' problem from rnorman -- Fri Feb 16 07:41:58 1990 <<<

Problem: Getting "WARNING: OVRRUN ERROR"

Cause: It looks like it has something to do with "Lamlink", because
       if Lamlink is toggled "INACTIVE", no error occurs.  This could
       be a problem with the Lamlink software? I'm not sure at this point.

Solution: For the time, Lamlink has been set to "INACTIVE" on the parameters
          page.  This will remove the error message.  The lam1 is up.

      NOTE: Lamlink users, have you noticed any problems with collecting
            data?  Or have you changed any programming in the last week or so?
           

>>> 'lam1' problem from mudie -- Wed Feb 21 16:42:36 1990 <<<

test problem, please ignore

>>> 'lam1' problem from cjkim -- Wed Feb 21 20:34:57 1990 <<<


Gas3 (Helium?) does not stabilize.  I was running a standard poly etch
recipe with just one wafer, followed by O2 scurge.  I quit the process
with manual end-point.

>>> 'lam1' problem from rnorman -- Thu Feb 22 14:57:18 1990 <<<

Problem: Gas 3, Helium, does not stabilize.

Solution: After running 3 or 4 "O2 cleans" I could not duplicate
          the problem.  The Gas3 MFC normally fluctuates 3-7 sccm,
          if this is not acceptable we could change the MFC out.
          The lam1 is up.

>>> 'lam1' problem from judy -- Tue Mar  6 12:05:22 1990 <<<

He flow rate too low again - 119 sccm instead of 130 sccm.

>>> 'lam1' problem from rnorman -- Tue Mar  6 14:57:20 1990 <<<

Due to the low He flow tomorrow I will install a new unit MFC.

>>> 'lam1' problem from rnorman -- Wed Mar  7 07:17:39 1990 <<<

Problem: The He flow is occasionally below set-point by as much as
         11 sccm.

Cause: Tylan admitted that their MFC's have a hard time controlling
       He gas, which was the case is this situation.

Solution: The Tylan 200 sccm He MFC was removed and a Unit 200 sccm
          He MFC was installed.  The new MFC was pumped out and purge
          off and on for 10 minutes.  It was then tested, running an
          O2 plasma clean.  The lam1 is up.

>>> 'lam1' problem from rnorman -- Mon Mar 19 09:08:39 1990 <<<

The users of the SECS link to lam1 and lam2 have reported 
"No SECS Link" error on both lams.  This looks like something
wrong with the port to the lams SECS link communication.  Could
smiles or ljmassa check out this port problem.

>>> 'lam1' problem from rnorman -- Tue Mar 20 14:05:46 1990 <<<

clean problem on lam1 from rnorman (20-mar-1990 14:00:20)

User Comments:
This is a test.,

Diagnosed as clean (chamber clean) by rnorman (20-mar-1990 14:05:25)

Comments from rnorman at 20-mar-1990 14:05:30 :
This is still a test.

>>> 'lam1' problem from aplee -- Tue Mar 20 21:44:38 1990 <<<

Transmit failure kept coming on the screen, etched two wafers, results
were terrible. The wafer turned black then turned into rusty red.
Disaster.

>>> 'lam1' problem from aplee -- Tue Mar 20 23:09:02 1990 <<<

After HF dip, I retried, all is ok. 
Sorry.

>>> 'lam1' problem from rnorman -- Wed Mar 21 11:12:54 1990 <<<

We are getting "Warning: transmit error" on both lams; this has to do
with the SECS communication.  This error will not effect your process,
so please ignore.

>>> 'lam1' problem from ljmassa -- Wed Mar 21 11:37:54 1990 <<<

Subject: lam1 lma2 communcations problem
	From: rnorman (Robert L. Norman Jr.)
	Message-Id: <9003211916.AA04079@argon.berkeley.edu.>
	To: debra, lab_equip_probs, lam1, ljmassa, parrish, rnorman, tom
	Subject: lam1 problem
	Status: R

	We are getting "Warning: transmit error" on both lams; this has to do
	with the SECS communication.  This error will not effect your process,
	so please ignore.


Robert, will you please phone me when you have a chance about this problem?

	Thanks
        Lauren 
 

>>> 'lam1' problem from ljmassa -- Thu Mar 22 15:14:45 1990 <<<


test

>>> 'lam1' problem from rnorman -- Mon Apr  2 11:24:33 1990 <<<

Problem: When pumping down the mechanical pump makes a loud
         walrus cry.

Cause: The "fill" lid was not on.

Solution: The lid was installed and tightened down.
          Tha lam1 is up for use.

>>> 'lam1' problem from phillip -- Wed Apr  4 08:27:41 1990 <<<

The problem with the argon 'lamlink' has been unearthed.
Verbal communication with Lauren is necessary to activate
the computer port in software. As she is off today, this will
be accmplished upon her return to work.

>>> 'lam1' problem from rnorman -- Thu Apr  5 10:47:19 1990 <<<

Problem: MFC display showing a non-zero nubers when there was no flow.

Cause: The  MFC's were in need of zero calibration.

Solution: The Analog System was calibrated and then the MFC's
          were zeroed.  Initially the CCL4 MFC displayed a 
          +5 sccm, O2 showed - 5 to 9 sccm, and He displayed
          -18 to 19 sccm.  What this is saying is before the 
          zero calibration these 3 MFC's had an off set of the
          above flows, ie) for the He MFC to get a set point of
          100 sccm the MFC was flowing 118 to 119 sccm.  The 
          MFC's are now at zeroed and the lam1 is up.

>>> 'lam1' problem from tom -- Wed Apr 18 15:09:04 1990 <<<

Entry airlock door not opening. rnorman thinks the solenoid needs
to be replaced. He will do that in the morning.

>>> 'lam1' fix from rnorman -- Thu Apr 19 10:32:20 1990 <<<

Problem: Entry airlock outer door was not opening.

Cause: Solenoid #3 on the entry side was clogged, thus no air
      output to open the door.

Solution: The solenoid was removed and cleaned.  The air lock
        door was tested and works well.  The lam1 is up.

>>> 'lam1' problem from judy -- Thu May  3 11:54:04 1990 <<<

Entry door won't open even though lam1 is enabled!?  I was able to run a 
process only O2 clean with no trouble.  When I started my poly etch 
process the wafer was loaded and stopped on the plunger waiting for 
the entry door to open.  Robert Norman suggested that this could be a 
problem with the solenoid controlling the entry door.

Mike

>>> 'lam1' fix from rnorman -- Fri May  4 11:59:25 1990 <<<

Problem: entry LL outer door not opening.

Cause: Solenoid failure, #4.

Solution: Replaced solenoid.  Lam is up.

>>> 'lam1' problem from judy -- Mon May  7 12:20:08 1990 <<<

-> He flow rate low - 120 sccm instead of 130 sccm set point.  Is the
   MFC bad?

-> There is a deep popping sound that comes from the entry chamber
   as the door to the entry chamber is opened - is this bad?

>>> 'lam1' fix from rnorman -- Tue May  8 08:32:08 1990 <<<

Problem: MFC #3, He flow rate low; 120 instead of 130 sccm. Also, entry door
      
Cause: The zero was off by 9 sccm, 47 counts.

Solution: The MFC was zeroed.  The lam1 is up.

>>> 'lam1' fix from mudie -- Tue Jun 12 16:35:25 1990 <<<

 problem on lam1 from mudie (12-jun-1990 16:26:32)

User Comments:
test
Diagnosed as flow-sensor (water flow sensor problem) by mudie (12-jun-1990 16:34

Comments from mudie at 12-jun-1990 16:34:32 :
test update
Comments from mudie at 12-jun-1990 16:35:12 :
clearing lam problem

>>> 'lam1' fix from mudie -- Fri Jun 15 15:12:48 1990 <<<

lam1only             problem on lam1 from mudie (15-jun-1990

User Comments:
test problem 2
Diagnosed as endpoint-window (endpoint detector problem) by mudie (15-jun-1990 1

Comments from mudie at 15-jun-1990 15:12:36 :
clearing

>>> 'lam1' fix from mudie -- Fri Jun 15 15:14:13 1990 <<<

broken-wafer problem on lam1 from mudie (15-jun-1990 15:10:5

User Comments:
dummy problem 1

Diagnosed as chiller-water-level (low water level) by mudie (15-jun-1990 15:14:0

Comments from mudie at 15-jun-1990 15:14:05 :
clearing

>>> 'lam1' fix from mudie -- Tue Jun 19 18:04:49 1990 <<<

broken-wafer problem on lam1 from mudie (19-jun-1990 17:57:3

User Comments:
test report

Comments from mudie at 19-jun-1990 18:00:21 :
report update


Diagnosed as recipe-error (Process/User Related Problems) by mudie (19-jun-1990 

Comments from mudie at 19-jun-1990 18:04:38 :
testing clear

>>> 'lam1' fix from mudie -- Thu Jun 21 12:55:55 1990 <<<

wafer-feed, air-lock-entry problem on lam1 from mudie (21-jun-1990 12:

air lock problem

Diagnosed as indexer-motor (NA) by mudie (21-jun-1990 12:54:36)

Comments from mudie at 21-jun-1990 12:55:32 :
lam1 repaired, back in operation
