>>> 'technics-b' problem from sylee -- Tue Jan  3 10:06:10 1989 <<<

The bottom plate looks still dirty. It need to be cleaned more.

>>> 'technics-b' problem from sylee -- Wed Jan  4 15:59:10 1989 <<<

Two problems in technics-b. 1) Pumping seems less effective. It took
about 15 min to pump down to 40 mTorr. Also, it seemed not pumping
below 40 mTorr.  2) The Murcury pressure guage was not working
during venting, although the digital read-out works fine.

>>> 'technics-b' problem from hebert -- Fri Jan  6 17:08:44 1989 <<<

Tested the uniformity of SiO2 dep using previously described
dep condition. Uniformity is varies by 20% across a 2 in wafer
without rotating the wafer.

At 4 PM there was either a SiH4 leak causing SiO2 dust to
precipitate from the air around technics-b or there was smoke
from the mech pump. Neither SY Lee or myself thought it smelled
like pump oil, however RNorman  thought that he could smell 
some burning oil.

>>> 'technics-b' problem from bob -- Mon Jan  9 15:38:51 1989 <<<

technics-b has a water leak on the upper electrode. It 
should not be operated until this is repaired. This 
problem will be looked into in the morning.

>>> 'technics-b' problem from evan -- Fri Jan 13 16:06:39 1989 <<<

problem:water leak (and other things)
cause: water leaking where the teflon elbow enters the top electrode.
solution: removed the electrode, cleaned it up,replaced the fitting and
reinstalled the fitting.
  James machined some stainless screws to make adjustable feet for the
bottom electrode.  Measured the parallelism using a ball of putty and
set the feet as close as can be done (using putty).
  The water leak p[roblem was solved but the unit would not pump down.
  (see next problem report)

>>> 'technics-b' problem from bob -- Fri Jan 13 16:14:21 1989 <<<

technics-b  has had a bad water input fitting replaced.
A new o-ring was installed in the 1/2 ultra-torr fitting 
on the heater feedthrough.
A new heater has been installed as the old one was cracked.
The platten has been leveled and new screws installed on both
the top and underside of the platten.
The pressure readout was adjusted.
The pressure readout seems to be bad as its drifts a lot. We
will look at this closer on Tuesday when we return.
technics-b had this problem before we looked into its
problems and is useable. The ROR is pretty good. I feel
users should get good results.
technics-b is up.
.

>>> 'technics-b' problem from evan -- Fri Jan 13 16:14:50 1989 <<<

problem: would not pump down after H2O fix.
cause: leak in heating coil
solution: replaced the heating coil; 
The unit now pumps down to around 20mTorr.  The Baratron seems to be
acting up.  It might have too much deposition on it's plate.
After several vacuum and vent cycles it suddenly changed it's range
by 40-50mTorr.  Users should report any unusal readings.

technics-b is up and running.

>>> 'technics-b' problem from sylee -- Tue Jan 17 19:11:06 1989 <<<

Hebert and I found that the uniformity on 2 inch wafer is about
15 to 20 %.  Uniformity can be improved significantly by rotating
the wafer 180 degree. 
However, deposition rates seem to change, i.e. from 120 A/min to
80 A/min, graually as we used. Please advise.
From bob Thu Jan 19 07:36:16 1989
Received: by argon (5.57/1.16)
	id AA10070; Thu, 19 Jan 89 07:36:07 PST
From: bob (Robert M. Hamilton)
Message-Id: <8901191536.AA10070@argon>
To: technics-b
Subject: uniformity
Date: Thu, 19 Jan 89 07:36:05 PST
Status: RO

I would like to point out where we stand re: uniformity. The
mass flow controllers have been removed and tested on
several occasions to try and trace uniformity problems. They
have always been in calibration. Parallelism between the
upper and lower electrode have been measured and adjusted so
we know the electrodes are currently parallel. A new
substrate heater was installed as the older on had cracked
due to useage (300C does them in quickly). This heater was
installed properly and a lot of torque was used to make sure
adequate thermal contact was made for uniform heating. The
electrode distance is basically controlled by the system
design however we may be able to vary this. The gas
injection ring was cleaned after a long SiN run and shuld
not be causing problems. It will be checked again. 

I am at a loss as to what to try next! We know the machine
has produced excellent uniformity in a few past runs. Phill
Guillory and I will meet with Dave Hebert and try and work
out a system to improve uniformity. I welcome any
suggestions.

bob

------- Forwarded Message

Return-Path: sylee
Received: by argon (5.57/1.16)
	id AA09202; Wed, 18 Jan 89 18:24:18 PST
Date: Wed, 18 Jan 89 18:24:18 PST
From: sylee (Soo Young Lee)
Message-Id: <8901190224.AA09202@argon>
To: bob, hebert, phil
Subject: Technics-b 


Uniformity without rotating substrate is about 28 % on 2 " wafer. 
Rotation of the wafer during deposition increased uniformity upto
5-6 %, but caused changes in dep. rate and Nf.  Etching experiment 
results showed, however, that the dep.rate was not changed as observed
by ellipsometer measurement. Apparent decreasing thickness and increasing
Nf seem result from the interrupted deposition for rotation. The 
rotation approach is not recommended because of unreliable readings.
Uniformity needs to be improved in Technics-b ASAP.

------- End of Forwarded Message


From sylee Wed Jan 18 18:24:22 1989
Received: by argon (5.57/1.16)
	id AA09202; Wed, 18 Jan 89 18:24:18 PST
Date: Wed, 18 Jan 89 18:24:18 PST
From: sylee (Soo Young Lee)
Message-Id: <8901190224.AA09202@argon>
To: bob, hebert, phil
Subject: Technics-b 
Status: RO


Uniformity without rotating substrate is about 28 % on 2 " wafer. 
Rotation of the wafer during deposition increased uniformity upto
5-6 %, but caused changes in dep. rate and Nf.  Etching experiment 
results showed, however, that the dep.rate was not changed as observed
by ellipsometer measurement. Apparent decreasing thickness and increasing
Nf seem result from the interrupted deposition for rotation. The 
rotation approach is not recommended because of unreliable readings.
Uniformity needs to be improved in Technics-b ASAP.

From sylee Mon Jan 30 13:12:50 1989
Received: by argon (5.57/1.16)
	id AA20973; Mon, 30 Jan 89 13:12:47 PST
Date: Mon, 30 Jan 89 13:12:47 PST
From: sylee (Soo Young Lee)
Message-Id: <8901302112.AA20973@argon>
To: bob, hebert, phillip
Subject: uniformity of technics-b
Status: R

Good news! The uniformity on 4 " wafer showed about 5 % variation in
thickness, which is excellent. Also ran the experiment using four
2 " wafers on variuos locations on the bottom plate. Thickness variation
varies from 3 % on one location to 19.5 % on the other location. It seems
that the condition of Technics-b is as good as it used to be. It could be
slightly better than before. The dep rate seems a little bit higher, i.e.
115-128 A/min. I am gonna use it as it is. Technics-b is up, finally.


>>> 'technics-b' problem from phillip -- Mon Jan 30 13:17:50 1989 <<<

The uniformity problem is resolved well enough to use the machine.
(Further info in sylee's report previous to this in file.)

>>> 'technics-b' problem from sylee -- Mon Jan 30 17:29:40 1989 <<<

Temperature is not controlled above 290 C. It looks like a thermo-
couple contact problem.

>>> 'technics-b' problem from phillip -- Tue Jan 31 10:30:11 1989 <<<

P: Temp. not controlled above 290dC (per sylee).
S: Replaced K type tc (the wrong type) with a new J type tc.
   The control problem is fixed.

>>> 'technics-b' problem from bob -- Tue Jan 31 16:00:14 1989 <<<

Please note: 
There is a chart with some major temperature corrections posted on
top of technics-b. It is self explanatory.
From sylee Tue Jan 31 20:24:02 1989
Received: by argon (5.57/1.16)
	id AA19651; Tue, 31 Jan 89 20:23:59 PST
Date: Tue, 31 Jan 89 20:23:59 PST
From: sylee (Soo Young Lee)
Message-Id: <8902010423.AA19651@argon>
To: bob, hebert, phillip
Subject: technics-b uniformity
Status: R

Uniformity of oxide is significantly improved using a low RF power.
Thickness variation reduced to 5 % from 25 % by lowering power from
30W to 10W on 2.25 " wafers. The only problem with 10 W deposition
is that it causes a high Nf. The adjustment of N2O and silane flow
rates have to be made accordingly.  The deposition rate is 100A/min
which is same as before. Temperature control is very good. Thanks
for the troble!


>>> 'technics-b' problem from tam -- Thu Feb  9 21:17:46 1989 <<<

One of the water tube on the back of technics-b bursted just after I
enabled it.  (I hope it is water!)  A liquid was splashed all over 
the wall behind the unit.  Please fix it as soon as possible.

>>> 'technics-b' problem from phillip -- Fri Feb 10 09:46:39 1989 <<<

The -b machine will be down until noon for PM.

>>> 'technics-b' problem from phillip -- Fri Feb 10 12:41:37 1989 <<<

P: -b machine leaking water and vacuum at a copius rate.
S: Repaired water leaks in cooling water tubing and platen.
   Repaired vacuum leak in upper (RF) electrode. 
  This unit is on line, up, and running.

>>> 'technics-b' problem from tam -- Mon Mar  6 17:03:10 1989 <<<

The pressure gauge on the front panel is not working.  I can read
the pressure from the digital meter for pressure less than 1 torr
only.

>>> 'technics-b' problem from phillip -- Tue Mar  7 06:56:06 1989 <<<

P: Nelson reports the analog vacuum gauge on the -b
   does not work.
S: There is a vacuum switch on the LH side of the machine.
   The switch controls the on/off state of the gauge.
   Found switch in 'off' position. 
   -b is up and running.

>>> 'technics-b' problem from tam -- Tue Apr 11 14:32:25 1989 <<<

The uniformity of the deposition of oxide is gone way done.

>>> 'technics-b' problem from bob -- Tue Apr 11 15:31:03 1989 <<<

Phillip believes this problem maybe associated witha shut off of the
supply water done during hep install. He will investigate in the AM.

>>> 'technics-b' problem from phillip -- Wed Apr 12 08:08:10 1989 <<<

Ran uniformity test wafer. The resultant oxide appeared visually o.k.
Yesterday's problem as experienced by Nelson was caused by failure of

a water interlock when the water went off. 
Magneton is using -b this a.m. and will apprise us of his results.

>>> 'technics-b' problem from lyons -- Sun Apr 23 14:53:11 1989 <<<

system needs to be cleaned, stuff is flaking off the chamber
walls pretty badly.

>>> 'technics-b' problem from phillip -- Mon Apr 24 07:46:52 1989 <<<

The -b is undergoing a freon clean as of this writing.

>>> 'technics-b' problem from phillip -- Wed May  3 14:06:16 1989 <<<

P: gas 2 solenoid does not operate per parameters. It is being
   worked on.

>>> 'technics-b' problem from evan -- Wed May  3 16:12:24 1989 <<<

The electronics for the solenoid were repaired (replaced Q202).  I
replaced the circuit boards and closed up the cabinet.  The solenoid
is working properly but I am not sure if phillip has anything left to do
before returning the technics-b to service.  He will be able to finish up
the repair early tomorrow a.m.

>>> 'technics-b' problem from phillip -- Thu May  4 09:21:21 1989 <<<

P:  Function 'gas2' leaks regardless of bias.
S: Replaced control solenoid for gas2 in PE module.
   Replaced vacuum pump filter and calibrated Baritron.
   (Also, per EU SOK KIM's request: a. reduced vent gas rate as
     not to stir up the silicon dioxide , or any other, flakes.
     b. paralleled n2 gas in to 'gas2' port on a switch. eskim can
     selectively choose chamber gas between freon and n2. This switch
     is in the rear of the machine . The idle position should be on
     the freon side.

>>> 'technics-b' problem from han -- Thu Jun 29 13:51:53 1989 <<<

We need two things to be done with Technics-b asap for less pin holes
and particulates.
  1.  Replace the existing pump with a pump of higher pumping capability.
          (This job is supposed to be done by James Parrish.)
  2.  Clean the chamber with HF and others with proper cleaning solvent.
          (This one is supposed to be done by Phil Guillory.)

>>> 'technics-b' problem from field -- Wed Jul 12 15:15:55 1989 <<<

Don't know if this is a problem or not - the freon line for
cleaning the system doesn't behave as I'm used to.  Turned the
(new?) 3-way valve at the back of the machine to the 
freon position, opened the valves for freon gas flow, and found
that adjusting the regulator pressure had no effect on the
pressure in the technics-b chamber - I am used to adjusting
the regulator pressure to adjust the pressure to 300 mTorr in
the chamber for the plasma clean step.  

I closed the valves and returned the 3-way valve to its original
position - will skip the freon clean this time.

>>> 'technics-b' problem from field -- Wed Jul 12 15:59:16 1989 <<<

Temperature controller seems worse than it ever was - dial in
a 250 C setpoint and see the temperature overshoot to 311 C
and undershoot to 192 C.  I don't recall this ever being that
bad!

>>> 'technics-b' problem from phillip -- Thu Jul 13 08:13:33 1989 <<<

P: Locally repaired,recently installed temp controller
   subject to large variations in temperature.
S: Replaced same with known good unit. This problem
   as reported by Leslie is fixed. -b  is up.

>>> 'technics-b' problem from parrish -- Fri Jul 14 11:49:47 1989 <<<

System will be out of service this afternoon for mech-pump change. Proberly
until around 2:30 or 3:00.

>>> 'technics-b' problem from parrish -- Fri Jul 14 15:18:55 1989 <<<

problem:   bigger pump needed.

cause:     a new process 

solution:  removed orignal LH-D16A (14.1 cfm) and installed a LH-D30A (28.8cfm)
           system is up.
From phillip Mon Jul 17 06:46:44 1989
Received: by argon (5.57/1.16)
	id AA14085; Mon, 17 Jul 89 06:46:41 PDT
Date: Mon, 17 Jul 89 06:46:41 PDT
From: phillip (Phill Guillory)
Message-Id: <8907171346.AA14085@argon>
To: evan, lab_equip_probs, parrish, phillip
Subject: power problem
Status: R

Installed 220v 1p outlet for technics-b new pump.
This is a TEMPORARY installation.


>>> 'technics-b' problem from bob -- Wed Jul 19 07:52:29 1989 <<<

A chamber clean was performed on technics-b July 18th. The gas ring
was removed and cleaned with scothbrite. The chamber was wiped down
with a dilute HF solution and then DI. Deposits on the upper electrode
were removed with scotchbrite. technics-b is up for use.

>>> 'technics-b' problem from sylee -- Sat Jul 22 14:18:06 1989 <<<

Technics-b does not pumping. The mechanical pump makes a noise and 
does not pump  below 300 Torr.  I have used it about 2 hours without
any pumping problem.
The other problem is that since we put a new mechanical pump the conditions
which gave a reliable and consistant oxide in terms of Nf and thickness
uniformity can not be used. A new set of conditions must be obtained.

>>> 'technics-b' problem from bob -- Mon Jul 24 07:33:42 1989 <<<

There is a large vacuum leak associated with the chamber on technics-b. 
It prevents the chamber from pumping down. Phil Guillory is looking into 
this.

>>> 'technics-b' problem from phillip -- Mon Jul 24 11:29:10 1989 <<<

P: Chamber will not reach 35 um base pressure.
C: The new vacuum pump sucked the upper electrode loose.
S: Repaired all 6 electrode insulators. Retorqued electrode
   into proper position. 
   Replaced baritron pressure tranducer.
   This machine is up and running.
From phillip Tue Jul 25 14:52:04 1989
Received: by argon (5.57/1.16)
	id AA02191; Tue, 25 Jul 89 14:52:01 PDT
Date: Tue, 25 Jul 89 14:52:01 PDT
From: phillip (Phill Guillory)
Message-Id: <8907252152.AA02191@argon>
To: bob
Subject: technics-b
Status: R

 If the intention is to leave the 220vac pump on -b,
I need to run new power leads for it. The connection
it is running off currently is only temporary.
FYI, pg

From bob Tue Jul 25 14:54:59 1989
Received: by argon (5.57/1.16)
	id AA02219; Tue, 25 Jul 89 14:54:57 PDT
From: bob (Robert M. Hamilton)
Message-Id: <8907252154.AA02219@argon>
To: phillip
Subject: Re: technics-b 
In-Reply-To: Your message of Tue, 25 Jul 89 14:52:01 -0700.
             <8907252152.AA02191@argon> 
Date: Tue, 25 Jul 89 14:54:55 PDT
Status: R

I think we will know the answer to the the permenancy of the
new mech pump in about 1 week.
bob


>>> 'technics-b' problem from hebert -- Wed Jul 26 16:03:29 1989 <<<

The chamber won't rough out due to a water leak at the powered
electrode. I removed the top cover and the leak is in the thread
dope at the plastic elbow to Al plate.

THE SYSTEM IS DOWN.

>>> 'technics-b' problem from parrish -- Thu Jul 27 10:25:36 1989 <<<

update:  the motor on the pump just burned up, at lease it smoked and shut-off
we will be checking it out immediately.

>>> 'technics-b' problem from phillip -- Wed Aug  2 10:55:35 1989 <<<

The -b is assembled internally. It now needs a vacuum pump installed.

>>> 'technics-b' problem from parrish -- Thu Aug  3 15:27:24 1989 <<<

fore line needs cleaning, and the oil in the pump needs changing, the
pump is pumping at 25 microns it started at 30, will let pump run over
night, change the oil and if everything works out system should be back
together first thing in the morning.

>>> 'technics-b' problem from parrish -- Fri Aug  4 14:49:27 1989 <<<

update:   Changed the pump, cleaned the foreline, and reinstalled, only
to find water in the valve; So the valve has to be removed, cleaned, leak
checked and reinstalled.

>>> 'technics-b' problem from bob -- Tue Aug  8 15:01:02 1989 <<<

technics-b is almost ready to be returned to service. It is
still plaqued by a high ROR. This is attributed to the
compression fitting on the capacitance manometer. It is
being serviced by Phillip. Users will be informed as soon as
it is ready. It has a very high priority.

>>> 'technics-b' problem from phillip -- Wed Aug  9 07:47:31 1989 <<<

P: High ROR from base pressure.
S: Replaced Baritron nylon ferrule.
   Replaced analog gauge tubing.
   The -b is available for use.

>>> 'technics-b' problem from parrish -- Mon Aug 21 13:46:47 1989 <<<

roughing pump has been reinstalled.

>>> 'technics-b' problem from phillip -- Mon Aug 21 14:21:17 1989 <<<

The -b machine is available for use.

>>> 'technics-b' problem from phillip -- Tue Aug 22 09:19:57 1989 <<<

The -b machine is down awaiting exhaust parts.

>>> 'technics-b' problem from parrish -- Tue Aug 22 15:31:12 1989 <<<

exhaust connected,but there is no N2 flowing. will investigate in the
morning.

>>> 'technics-b' problem from phillip -- Wed Aug 23 09:13:47 1989 <<<

P: No n2 purge on silane process mechanical pump.
S: Reset n2 lines to supply purge to pumps.
   The -b machine is UP and available for use.

>>> 'technics-b' problem from hebert -- Thu Sep  7 13:16:36 1989 <<<

The power cord to the heat controller is badly frayed and needs
to be replaced.

>>> 'technics-b' problem from phillip -- Fri Sep 15 07:55:17 1989 <<<

Replaced frayed a.c. line cord per David's report.
The --b machine is up.

>>> 'technics-b' problem from hebert -- Fri Oct 13 12:52:30 1989 <<<

The rough valve doesn't open, thereby preventing the chamber
from roughing out. The mech pump is on.

>>> 'technics-b' problem from phillip -- Fri Oct 13 13:13:51 1989 <<<

-b is in working order. This has been checked by Dave and me.
Whatever caused the earlier problem is unknown.

>>> 'technics-b' problem from hebert -- Thu Nov  9 13:40:41 1989 <<<

I lifted the cover and water spilled out from the top electrode.

TECHNICS-B is DOWN.

>>> 'technics-b' problem from phillip -- Fri Nov 10 08:31:40 1989 <<<

Changed cooling mode from water to air.
This machine is available for use.

>>> 'technics-b' problem from hebert -- Fri Nov 10 13:46:03 1989 <<<

The chamber won't rough out below 90 mTorr and a plasma
ignites without any gases on due to the leak.

>>> 'technics-b' problem from parrish -- Tue Nov 14 11:31:05 1989 <<<

system down for repair of leak

>>> 'technics-b' problem from parrish -- Wed Nov 15 13:35:19 1989 <<<

problem:   system only pump down to 70 microns,and leak back rate goes
           to 2 torr in about 2mins.

cause:     nylon insulation ring is compression set, and other leaks in
           (1) the gas line, and (2) the KF-40 fitting to the chamber

solution:  removed the top electrode and replaced the insulation ring,
           checked the gas lines for leaks, found one fitting leaking
           tighten it and also tighten the chamber fittings. 
           system is up, pumps down to 23 microns with about 2 microns
           in 4 seconds.

>>> 'technics-b' problem from liew -- Thu Nov 16 16:14:32 1989 <<<

Would not pump down when sol'n is opened. Suspect vent valve was not
closed. Technics-b is down.

>>> 'technics-b' problem from parrish -- Fri Nov 17 09:51:58 1989 <<<

update:   system down for mfg. of insulation ring( which is the reason for
         system not pumping down) apparently it over heated and melted.

>>> 'technics-b' problem from parrish -- Tue Nov 21 10:57:42 1989 <<<

problem:   insulation ring melted

cause:     air cooling was not sufficent in cooling electrode

solution:  removed melted ring, mfg. a new one and replaced, and disconnect
           air lines and replaced with water. system is up for use.

>>> 'technics-b' problem from hebert -- Fri Feb 23 15:53:21 1990 <<<

The temperature does not seem to recover as fast as it usually
does after loading a wafer. Maybe the TC is not making good
contact with the substrate table.

There was some instability in the SiH4 MFC. I tapped the side
panel of the PD Module, and the MFC stabilized. It fluctuated
between 4 and 12 sccm SiH4 at the beginning of my test dep
and went down to -25 when turned off.

Dispite these anomalities, my dep went well using 63.0 sccm N20,
8.0 sccm SiH4, and 10 W RF. The dep rate was 130 A/min, Nf = 1.48.

>>> 'technics-b' problem from phillip -- Tue Mar  6 08:29:16 1990 <<<

P: Base pressure hovering @ ~60 microns (too high).
S: Replaced all feed-thru o-rings. Calibrated capacitance
   manometer. Removed oxidation from tc sheath.

the -b machine should perform better now.

>>> 'technics-b' problem from fujieda -- Thu Mar  8 12:52:45 1990 <<<

Explosion after the end of the run when N2O is introduced to purge SiH4. I reported the problem to staff and he will take care of it. The dep. conditions of my run is SiH4 20sccm, temp.300C,20W rf power, dep. time 1 hr, roteted the substrate halfway.

>>> 'technics-b' problem from phillip -- Thu Mar  8 13:22:24 1990 <<<

Restarted slight n2 pump purge.
CF4 clean in progress.

>>> 'technics-b' problem from phillip -- Thu Mar  8 14:41:50 1990 <<<

P: Violent reaction in chamber left it filthy.
S: CH4 clean for 2 hours rendered the chamber clean'
   and suitable for use.
-b is up and available for use.

>>> 'technics-b' problem from bob -- Fri Mar  9 14:55:11 1990 <<<

The n2 case purge for the exhaust of technics-b has been checked.
It has some oil in the N2 rotameter. The rotameters will be replaced
with superior units and additional check valves will be installed.
This will be added to parrish's techjobs.

>>> 'technics-b' problem from bob -- Fri Mar  9 14:57:39 1990 <<<

Then case purge on technics-b has been checked. The flow rate is adequate
for all processes used on technics-b.
technics-b is up.

>>> 'technics-b' problem from parrish -- Wed Mar 14 13:13:46 1990 <<<

problem:    rotometers not function properly

cause:      inferior quality

solution:   removed and replaced with a better quality one.

>>> 'technics-b' problem from field -- Thu Apr  5 16:56:19 1990 <<<

Base pressure pretty high - gets down to 75 mTorr after a LONG wait.
Also, when vent switch first thrown, makes a sound like a BART-door
closing.

>>> 'technics-b' fix from phillip -- Fri Apr  6 08:42:52 1990 <<<

P: High base pressure.
S: Replaced defected heater. The problem as reported
   by Leslie is fixed.
(A freon clean of the chamber before processing is advisable)
From hebert Fri Apr  6 10:04:22 1990
Return-Path: <hebert>
Received: by argon.berkeley.edu. (4.1/SMI-4.0)
	id AA07156; Fri, 6 Apr 90 10:04:12 PDT
Date: Fri, 6 Apr 90 10:04:12 PDT
From: hebert (David Hebert)
Message-Id: <9004061704.AA07156@argon.berkeley.edu.>
To: technics-b
Subject: technics-b comments
Status: R

When cleaning the chamber before starting your run, you should
use only Technicloths and methanol. Do not use acetone or DI water.
Acetone will damage the lid o-ring seal, and DI water causes the
background pressure of water to be high.


>>> 'technics-b' problem from hebert -- Thu Apr 12 07:40:15 1990 <<<

Over a 4 hour period, the chamber base pressure increased from
50 mTorr to 100 mTorr. 

I used 350 deg C electrode, 63.0 sccm N2O, 7.0 sccm SiH4, and
10 W to get a dep rate of 115 A/min and Nf=1.50. The uniformity
across a 100 mm wafer at the "4 o'clock" electrode position was 
within 7% across the wafer without rotating the substrate.

I checked the dep rate and film Nf at the beginning and end of the
time period that I used technics-b, and observed no change in either.
However, the chamber should be leak checked to determine whether
or not there is a leak.

Also, before starting my run, I noticed a yellow powder in the chamber.
This could be from the deposition of silicon nitride, which is NOT
permitted in this chamber. I removed the yellow powder at the predep
chamber clean step.

>>> 'technics-b' fix from phillip -- Thu Apr 12 08:27:21 1990 <<<

P: High base pressure.
S: Cleaned out capacitance manometer
   port. Calibrated baritron with standard.
   Base pressure ~20 microns. The Problem
   as reported by Dave is repaired.
The -b machine is  up and available for use.

>>> 'technics-b' problem from field -- Thu Apr 19 13:50:33 1990 <<<

Qualifying Diane Hoffstetter on technics-b.

BIG whiff of gas as we initially vented the machine - may be 
NH3.  Made Diane gag and her eyes water.  I could smell it
too (she was closer to the machine).

Please check machine for gas leaks!

>>> 'technics-b' problem from phillip -- Fri Apr 20 14:43:33 1990 <<<

There is a problem that minute amounts of NH3 are olifactorily
detectable. This poses no real safety or processing hazard.
This problem will be looked into on Monday a.m. Until then,

the machine is up and available for use.........
.,
,.

>>> 'technics-b' fix from phillip -- Mon Apr 23 13:01:53 1990 <<<

P: NH3 smell apparent when opening chamber.
S: Rebuilt 2 servo--solenoids. Replaced nupro
   pneumatically operated solenoid. 
The problem as reported by Leslie and Diane is fixed.
The -b machine is available for use.
