>>> 'technics-a' problem from hphlee -- Sat Apr  1 16:43:44 1989 <<<

	Power cannot be turned on as part of power failure in the
entire microlab.
henry

>>> 'technics-a' problem from magneton -- Tue Apr  4 13:43:18 1989 <<<

1.  When vented, the technics-a lets out a whine.

2.  When opened,  the temperature controller shoots up maybe 20C.
    I had the temperature set at 300, the load reached to only 280,
    however as I opened up the chamber the T shot up to 300.

>>> 'technics-a' problem from phillip -- Wed Apr  5 13:15:17 1989 <<<

P: Temp controller 20dC off of setpoint.
S: Relaced controller with known good spare.
   Set pid controller to specs.
  
(The watlow that came out of service will be repaired by
 Evan and returned to sink5. The 'ac load out' contacts on
the pc board need attention. Thanks to Evan for his assistance.)
{.

>>> 'technics-a' problem from magneton -- Sat May  6 12:21:38 1989 <<<

Power would not turn on though plasma mode indicator lit up
Knob was turned backwards and forwards but no plasma was
lit and the power meter showed 0 Watts.

>>> 'technics-a' problem from phillip -- Mon May  8 07:20:48 1989 <<<

P: No plasma per Magneton's report.
S: The -a and -b machine are arranged so that only ONE of
   them will work at a time. User eskim has had technics-b
   enabled for 69 hours now. 
    No plasma in -a because -b is enabled.

>>> 'technics-a' problem from hsin -- Tue Jun 13 10:19:15 1989 <<<

I can not start plasma. I don't know why?

Wei

>>> 'technics-a' problem from kuchta -- Wed Jun 14 09:30:06 1989 <<<


The 
The rf power would not go on.  Everything seemed functional.

>>> 'technics-a' problem from phillip -- Wed Jun 14 10:41:40 1989 <<<

S: Adjusted h2O flow thru platen. The 'no plasma' problem as
   reported by Dan Kuchta is abated. -a is available for use.

>>> 'technics-a' problem from liu -- Fri Jul  7 22:20:15 1989 <<<

	The pump was on before I enable. The substrate heater does not
work, the temperature can not go higher then 25C.

	Xiaoming Liu

>>> 'technics-a' problem from liu -- Sat Jul  8 11:07:47 1989 <<<

	Just try again. It was as same as yesterday.

	Xiaoming Liu

>>> 'technics-a' problem from phillip -- Mon Jul 10 07:33:25 1989 <<<

The -a machine has a faulty platen heater. This will be repaired today.

>>> 'technics-a' problem from phillip -- Mon Jul 10 14:24:12 1989 <<<

The reinstall of the platen heater will not be completed today.
The -a machine will be back on line by noon tomorrow.

>>> 'technics-a' problem from phillip -- Tue Jul 11 09:45:31 1989 <<<

P: Heater will not rise to setpoint.
S: Replaced open heater. Replaced BLOWN temp. controller.
   The temp controller that was changed looks as if it were
   unplugged under load. It is probably irrepairable.

Technics-a is again operational.

>>> 'technics-a' problem from kuchta -- Thu Jul 20 18:24:33 1989 <<<

Maybe this is a problem, maybe it isn't but...

during deposition the NH3 flow meter indicated that it was on (green Light)
and flow was ~1.0sccm even though the switch was set to off.

>>> 'technics-a' problem from phillip -- Fri Jul 21 06:51:42 1989 <<<

The ammonia channel of the technics system has a SIERRA brand
mass flow controller. The indicators are reversed due to this
aftermarket conversion.

>>> 'technics-a' problem from hoagland -- Wed Aug 16 17:10:54 1989 <<<

The vacuum pump for this machine has apparently failed.  On
power-up the pump made chugging sounds for 30 seconds before
resuming a normal hum.  An effort was made to pump down the
chamber but the baratron registered no change after 2 minutes-
This technics is down until further notice.

>>> 'technics-a' problem from parrish -- Thu Aug 17 11:18:13 1989 <<<

problem update:  the mech-pump was turned off at the time of the water
problem on technics-b and left off, the oil cooled down and caused the pump
not to start back up today. Also the pump on technics-b that was changed to
the system is not pumping because of water in the exhaust line. I can see
water in the oil winddow. I am trying to get one of these pumps going, there
is no other pump available.

>>> 'technics-a' problem from parrish -- Fri Aug 18 09:21:38 1989 <<<

problem:   pump seized

cause:     pump shut off under pressure

solution:  removed pump and replaced with a rebuilt one. system is up

>>> 'technics-a' problem from jayyang -- Fri Aug 18 14:35:39 1989 <<<

The chamber inside is very dirty, Bob is going to clean it after chamber is cooldown.

>>> 'technics-a' problem from bob -- Fri Aug 18 15:13:50 1989 <<<

I cleaned the chamber of debris which must have blown back into
the chamber when the pump failed. I notice that the ROR for this 
system is very high and jayyang noticed this earlier today. The
system has been plasma cleaned and seems useable even with the 
higher than normal ROR. The problem will be further investigated
on Monday.

>>> 'technics-a' problem from hsin -- Mon Aug 21 11:25:21 1989 <<<

Did not use the machine.  No venting and no pumping at all. Water
leak into the chamber.  Phil is checking the technics-a now.

Wei

>>> 'technics-a' problem from phillip -- Mon Aug 21 14:46:21 1989 <<<

The -a machine should be available for use by 10:00am, Tuesday ,8/22.

>>> 'technics-a' problem from phillip -- Tue Aug 22 09:21:22 1989 <<<

The upper (RF) electrode has developed a leak into the cooling
portion of itself. Water is excaping into the vacuum chamber.

A solution is being looked into.
This machine is DOWN until then.

>>> 'technics-a' problem from phillip -- Wed Aug 23 13:02:16 1989 <<<

The estimated time of completion  by the
machine shop for the upper electrode is
2:30pm today. The -a machine should be
completely reassembled and ready to use  by 
11:00am tomorrow,Thurs. 8/24.

>>> 'technics-a' problem from phillip -- Thu Aug 24 07:36:45 1989 <<<

The electrode which is being repaired will not be ready
until noon. 
 The -a machine will hopefully be reassembled by 3pm today.

>>> 'technics-a' problem from phillip -- Thu Aug 24 14:34:28 1989 <<<

P: Platen water leak.
S: Replaced heater. Resurfaced heating stage.
   New platen surface installed by machine shop.
   Switched quartz insulation ring to polymer variety.
   Good base pressure is achieved with  excellent rate
   of rise.
This machine is up and available for use.

>>> 'technics-a' problem from hing -- Wed Sep 27 23:42:40 1989 <<<

NH4 gas could not be turned on.

>>> 'technics-a' problem from bob -- Fri Sep 29 15:57:38 1989 <<<

Problems with the NH3 mfc on technics-a will be investigated on Monday
Oct 2nd.
Bob

>>> 'technics-a' problem from evan -- Mon Oct  2 14:56:04 1989 <<<

The NH3 controller has been removed for repair.  technics-a is up for
all other modes of operation (those not using NH3).

>>> 'technics-a' problem from evan -- Mon Oct  2 16:53:20 1989 <<<

The NH3 controller has an open ten-turn pot.  Parts have been ordered. It
should be back in service in a few days. All processes not using NH3 are
still available.

>>> 'technics-a' problem from evan -- Thu Oct 26 09:49:25 1989 <<<

problem: failure of NH3 controller
cause: broken 100K ohm front panel pot.
solution: replaced control pot. and knob.
The line has been well purged, pumped down, and the NH3 cylinder reopened.

technics-a is available for NH3 processes again.

>>> 'technics-a' problem from phillip -- Fri Nov 10 08:30:20 1989 <<<

Changed platen cooling mode from water to air.
This machine is available for use.

>>> 'technics-a' problem from hsin -- Thu Dec  7 18:10:55 1989 <<<

Dr. Du used the technics-a to deposit SiO2 film on Wednesday.
He found the index ( Nf ) of the film is too high : 1.78!!!
The BHF can not remove it!!  ( Actually the etching rate is
very slow, around 200 angstrom/ min.)  Therefore only two 
possible things happened: 1). Contamination occured in the 
chamber 2). Composition of the gas has been changed.

Could Phil take a look at the technics-a to see if it is dirty
in the chamber or there is a leakage somewhere?? 

If you have any more questions on the problem, please contact 
Dr. Du. I send this message for him because of his request.

Wei Hsin

>>> 'technics-a' problem from phillip -- Fri Dec  8 06:43:56 1989 <<<

P: SiO2 deposition parameters contaminated.
S: Switched machine from 'PE' chamber gas control
   to 'PD' gas controller gas control.
   
This should fix the problem as reported by Dr. Du.

>>> 'technics-a' problem from phillip -- Mon Dec 11 07:57:30 1989 <<<

the -a machine is being tested for uniformity this a.m.
It is unavailable for use until testing is complete (by noon).
From hebert Mon Dec 11 10:49:16 1989
Received: by argon (5.57/1.16)
	id AA08238; Mon, 11 Dec 89 10:49:05 PST
Date: Mon, 11 Dec 89 10:49:05 PST
From: hebert (David Hebert)
Message-Id: <8912111849.AA08238@argon>
To: bob, phillip, technics-a, technics-b, voros
Subject: technics-a comments 
Status: RO

I checked SiO2 deposition process in Technics-a using the recipe
that I use in Technics-b.

The chamber was cleaned with methanol and clean room wipes. It was then
pumped out and a CF4+O2 plasma was run until the electrode heated up.
The CF4+O2 was set at 150 mTorr and the power set at 75 W RF. The setpoint
for the heater was set at 350 deg C. When the temp reached 340 deg C, the
CF4+O2 plasma was turned off and the process was changed from PE mode
to PD mode. The N20 line was pumped out so until the flow thru the MFC
was less than 0.5 sccm N2O. The N2O bottle was then opened (i.e. I had
pumped the line out to the regulator). The N2O flow was adjusted to
63.0 sccm. The SiH4 flow was then adjusted to 8.0sccm. A predep was done
to coat the chamber using 10 W RF for about 15 minutes. A 100 mm wafer was
then loaded at the 4 o'clock electrode position. SiO2 was deposited for
13 minutes, the wafer removed to measure film Nf and XOX by ellips,
and then the wafer was placed on the electrode rotated 180 deg from the
original orientation, and SiO2 was deposited for another 13 minutes.
The results follow:

N2O  63.0 sccm
SiH4  8.0 sccm
Power 10 Watts
Set T  350 deg C
Start dep T: greater than 310 deg C


dep t= 13.0 minutes 
100 mm wafer   Center  1702 A   Nf=1.47
               Top     1505        1.47
               Bottom  1857        1.47
               Left    1673        1.47
               Right   1697        1.47
Dep rate: 130 A/min   Thickness variation: 20.9%

Rotate wafer 180 deg and deposit for an additional 13.0 minutes:
100 mm wafer   Center   3257 A   Nf= 1.48
               Top      3194         1.48
               Bottom   3334         1.47
               Left     3264         1.47
               Right    3370         1.48

dep Rate (ave for 26 minutes): 126 A/min   
Thickness variation (for 26 min dep with rotation): 5.4%

This is the same dep process that I use in Technics-b with the same
results. I've checked the breakdown voltage of 2000 A SiO2 films:
No breakdown below 100 V, and leakage current is typically less than
10E-7 amperes up to 100 V.

The chamber pressure rate of rise does NOT indicate a leak to the Technics-a
chamber. Film uniformity and Nf are very good for this type of CVD chamber
using the above recipe. Increasing the power to 30 W will increase
the dep rate by about 20% while having a deliterious effect on thickness
uniformity. Decreasing the temp below 300 deg C will effect Nf and 
thickness uniformity and dep rate. It is possible to get Nf below
1.60 using temps as low as 250 deg C, but a different recipe is required.
Accepted Nf for SiO2 deposited in this type of system is anything 
below 1.60. I ususally can get 1.46 to 1.49 quite easily. If Nf is too
high, I suggest reducing SiH4 flow and keeping N2O flow constant. In the
above recipe, silane flow can vary between 7.0 and 8.0 sccm.


>>> 'technics-a' problem from voros -- Tue Dec 12 15:37:36 1989 <<<

tehnics-a has been characterized by Dave Hebert and the recipe,
which is identical to the recipe for technics-b, has been entered
in the manual.

>>> 'technics-a' problem from parrish -- Wed Mar 14 13:10:22 1990 <<<

problem    nitrogen not flowing into roughing-pump

cause:     rotometers of inferior quality

solution:  removed old rotometers, and replaced with good quality one.

>>> 'technics-a' problem from liang -- Mon Apr  2 20:48:29 1990 <<<

there is no power for plasma in both etching and deposition mode.
chunlin

>>> 'technics-a' problem from phillip -- Tue Apr  3 08:12:50 1990 <<<

P: No plasma.
S: Flushed cooling lines to and from plasma
   interlock. Replaced blocked section of
   water line.
The -a machine is up and available for use.

>>> 'technics-a' problem from micro -- Fri Jun 15 16:48:07 1990 <<<

sorry...this is just a test

>>> 'technics-a' fix from micro -- Fri Jun 15 16:48:34 1990 <<<

this is just a test...
